Ellipsometer GES5E from Sopra

Ellipsometer GES5E from Sopra

GES5E Optical Platform allows various measurement mode from Standard Ellipsometry to generalized Ellipsometry going thru photometric measurements (in Transmission and Reflection), Scatterometry, luminescence measurements. All measurements are made automatically as a function of: wavelength, angle of incidence, polarization state and time. Standard spectral range is 230-900nm.

FEATURES:

Automatic Goniometer:
GES5E is. Softw equiped with automatic goniometerare allows to automatically place the measurement angle (from 10° to 90°)  to the optimum angle of measurement, allowing also scatterometry.

Automatic Microspots:
Allows the user to focus the beam on a very small area of the sample. Spot down to 50 µm can be achieved for specific applications. Also used when measuring thin transparent substrate. It enables physical extraction from the measurement of the parasitic light coming from backside reflection of the substrate. The backside correction can of course be done thru the software but optical treatment avoids assumption on number of reflections.

Automatic Compensator/Retarder:
Recommended when measuring transparent materials on transparent substrate for example. The Cos Delta been close to +/- 1 this lead to low accuracy (proportional to 1/SinDelta). The retarder place the measure out of this area. It allows to measure the full angular range for Delta and Psi, thus to access depolarisation coefficient. Using appropriate formalism, it also allows to reach 12 coefficients of the Mueller Matrix.

Mapping stage:
Allow automatic cartography measurements on several types of substrates of variable dimensions. Mapping stage can be supplied fully automatic or for manual operation, X-Y (when anisotropy is present, patterned wafers), Rho-theta, combined stage (X_Y theta for generalized SE).

Visualization CCD Camera:
The ellipsometers is equipped with a visualization systems.

EPA Ellipsometer Porosimeter Atmospheric:

The EPA (Ellipsometr ic Porosimeter Atmospheric pressure)  allows fast film characterization at ambient pressure and temperature. To make mesopore size investigation simple, cheap, and non toxic, we performed EP measurements using a pulsed air flow with controlled partial pressure of water. This system allows a fast partial pressure equilibration at each point of the isotherm (a complete adsorption-desorption cycle can be obtained within 30 min time)

The EPA setup is made of a spectroscopic ellipsometer on which is fixed a cell of environment control containing the film to analyze. In laboratories, gas volumetry analyses are usually time-consuming, mainly because of long pressure equilibration time within the analysis chamber. In the experimental setup of these experiments, we replaced the pressure equilibration system by a continuous flux of air containing a fixed partial pressure of adsorbate directly in contact with the mesoporous film to analyze.

CONTACT US

Phone: (+34)935 801 853

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Tlf.: (+34)935 801 853; ext. 363/335
staff 02 50   This email address is being protected from spambots. You need JavaScript enabled to view it.
Tlf.: (+34)935 801 853; ext. 364/335
staff 02 50   This email address is being protected from spambots. You need JavaScript enabled to view it.
Tlf.: (+34)935 801 853; ext. 365/335
staff 02 50   This email address is being protected from spambots. You need JavaScript enabled to view it.
Tlf.: (+34)935 801 853; ext. 365/335

LABORATORIES

  • L1: Optical Lithography Lab.
  • L2: Charact. Nanoscale Lab.
  • L3: Physico-Chemical Laboratory
  • L4: Chemical Synthesis Lab.
  • L5: Highly Control Humidity Lab.

EQUIPMENTS

  • Atomic Layer Deposition System Savannah from Cambrige NanoTech
  • Basi II-Acids & Corrosives
  • Basic I-Solvents
  • Centrifugue Allegra 64R from Beckman Coulter
  • Chemical Laboratory with Rotavapor
  • Chemical Laboratory with Spinner
  • Chemical Laboratory with Vacuum Line
  • Contact Angle Measuring System DSA 100 from KRÜSS
  • Dip Coater
  • Ellipsometer GES5E from Sopra

 

  • Evaporation System Auto 306 from Boc Edwards
  • Furnace Rapid thermal annealing from AS-micro
  • Glove Box GP(Concept)-II-P from JACOMEX
  • Inert atmosphere chamber from Trallero
  • Ion Milling /Sputtering / E Beam System from TSST
  • IR-Spectrometer Vertex 70 from Bruker
  • L5: Chemical Hood
  • LS 45 Spectrofuorometer, from Perkin-Elmer
  • Micro-Writer from Durham Magneto Optics LTD.
  • Microwave oven with controlled atmosphere Discover Explorer Hybrid from CEM

 

  • Nano Dip Coater ND-DC from NADETECH
  • Optical Microscope B-600 MET from OPTIKA
  • Photolithography Hood
  • Profilometer Nanopics 2100 from Nanopics
  • Profilometer P16+ from KLA Tencor
  • Reactive Ion Etcher RIE 2000 CE from South Bay Technology inc.
  • Rheometer HAAKE RheoStress RS600 from Thermo Electron Corporation
  • SPINNER SMA AC 6000 from SMA Suministro de Materiales y Asistencia
  • Tubular furnace ST 1002540 from HOBERSAL
  • Ultrasonic Wire bonder 4526 from Kuliche & Soffa

NANOQUIM @ 2017