Micro-Writer ML3

Micro-Writer ML3 from Durham Magneto Optics Ltd.

Micro-Writer ML3 from Durham Magneto Optics Ltd. (DMO) enables a direct-writing lithography by computer-controlled optics to project the exposure pattern directly onto the photoresist. This is one of the last generation of micro-writing devices and incorporates high performance laser-assisted technology.

FEATURES:

 · 149 mm x 149 mm maximum writing area

· 155 mm x 155 mm x 7 mm maximum wafer size

· 1 μm resolution across full writing area

· 385 nm lightsource (laser)

· Fast writing speed: up to 20 mm2/min writing speed (1 μm resolution)

· Autofocus system using yellow light (no minimum wafer size)

· High quality optical microscope camera with Olympus infinite conjugate x10 plan objective lens and yellow light illumination for alignment to lithographic markers on the wafer (±2 μm 3σ alignment accuracy). Additional x4 digital zoom can be selected in software

· Grey scale exposure mode for 3-D patterning (255 grey levels)

· 0.2 μm minimum addressable grid; 20 nm minimum sample stage step size

· Acceptable formats: CIF, BMP, TIFF

 

CONTACT US

Phone: (+34) 935 801 853

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Tlf.: (+34) 935 801 853; ext. 363/335
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Tlf.: (+34) 935 801 853; ext. 364/335
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Tlf.: (+34) 935 801 853; ext. 365/335

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